MultiSensor Solutions
Advancing to the new technology has never been easy for
IC and FPD manufacturers.
New methods and materials may be required (including:
metal gate electrodes, advanced silicides, ultra-thin copper barrier
materials, copper shunt films, LCD substrates (such as ITO), FTD substrate, etc).
In many cases no single material will emerge as clearly superior.
Manufacturers will need to develop a set of materials and processes
that best meet their needs.
Metrology requirements during the development phase may change rapidly.
MultiMetrixs´ MultiSensor RST system offers a wide range
of capabilities to overcome these challenges.
MultiSensor RST system is innovative tool to measure and inspect
metallic and ionic conductive films based on patented RST Technology.
The new system´s versatile modular design will be a key enabler for
manufacturers to solve metrology challenges when integrating of titanium,
tungsten, cobalt (and their alloys), as well as binary and ternary solid
solutions, InO, SnO, indium titanium oxide (ITO) and others new materials.
Also it will play essential role in developing the new production processes.
The MultiSensor RST offers the latest advances in RST Technology and can
also incorporate other metrology technologies in the same tool for superior
film measurement and characterization.
This will allow customized metrology solution for process development
and production monitoring almost in each IC fabrication process.
The MultiSensor RST provides industry highest throughput, a small
footprint, great accuracy and repeatability at the lowest cost of ownership.
The multipoint sensor head is the core technology of the MultiSensor RST.
This non-contact, non-destructive technique allows simultaneous
measurement in 49 to 127 points over entire surface of the wafer.
During the measurement process high frequency electromagnetic waves,
generated by high frequency generator, interact with one or a stack
of metallic films.
Resonance methods have the advantage of precision and high sensitivity
when it comes to detecting changes in the physical properties of materials
as a function of resistivity and magnetic permeability.
This is ascribed to the fact that frequency of the electromagnetic
resonance can be measured with a very high degree of accuracy.
Two oscillators - the film and the multipoint sensor head - are
inductively and capacitively coupled together.
Any change in material properties will induce a change in inductance,
which in turn results in a shift in the resonance frequency.
So, measurement of the frequency shift translates to directly testing
the electronic, dielectric or magnetic response of the material to the oscillating signal.
The MultiSensor RST can accurately measure the thickness, uniformity,
resistivity and sheet resistance of each layer in a single and a multi-layer
metal film stack on product wafers.
Also it can measure and map sheet resistance of LCD and FPD substrates.
The MultiSensor RST system could be configured as in-line stand-alone
metrology tool for high throughput applications.
Such tool can achieve throughputs of greater than 360 wafers/FTP
substrates per hour.
Also it could be integrated in most process tools for in-situ
measurement and production control (e.g. electroplating, CMP, PVD, etc.).
This system is designed to accelerate process ramp up time, allowing for
various production processes monitoring for maximum return on investment.
It is backed by MultiMetrixs´ commitment to provide superior
applications support to solve most difficult metrology challenges.
Partial list of applications that we have developed utilizing MultiSensor products:
- Simultaneous measurement of bare wafers:
thickness, resistivity, bow, warp, TTV, and other properties
- Instant measurement of film:
sheet resistance, resistivity, thickness, uniformity, and other properties
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